Quantax Micro-XRF
Trace Element Sensitivity with Minimal Sample Preparation
High-Speed Elemental X-ray Mapping even over Large Areas
Film Thickness Analysis
Highlights
10 ppm
检测极限
Enabling trace element analysis due to the lower spectral background
4 mm/s
travel speed
The optional Rapid Stage enables high-speed mapping over large areas
1 nm -40 µm
layer thickness range
Thin films starting from 1 nm up to multiple layer structures of 40 µm can be analyzed
Micro-XRF作为SEM中EDS分析的免费分析技术
- Micro-X射线荧光（Micro-XRF）光谱分析是使用扫描电子显微镜（SEM）对传统能量色散光谱（EDS）分析进行互补的非破坏性分析技术。此类分析对于表征未知样品中元素组成的表征至关重要，范围从大厘米大小的不均匀标本到小千分尺颗粒。
- X射线激发对痕量元素检测产生更高的灵敏度（低至低至10 ppmfor certain elements), an extended X-ray spectral range (最多40 keV），以及样本中更深度的信息。
- Equipped with an X-ray tube in combination with a micro-focusing X-ray optic yields small spot sizes of30 µm高强度吞吐量。
- 一个模块化压电阶段，专门设计用于安装在现有SEM阶段顶部4毫米/秒. This enables the acquisition of X-ray mapping data over a sample size of 50 x 50 mm (or higher), incorporating light element spectral data as well as trace element and/ or higher energy X-ray data in a fast and user-friendly workflow.
- The larger depth of X-ray excitation allows the characterization of multilayer systems starting from1 nm and ranging up to 40 µm, which is not possible with electron excitation.
Benefits
Expand your SEM analytical capabilities with the Micro-XRF and Rapid Stage
- Dual beam potential, both an e-beam and an X-ray beam, which offers new possibilities for the material characterization - Investigate samples simultaneously with both sources.
- 使用同一检测器同时进行电子束/微XRF采集，并包含光元素光谱数据以及痕量元素和/或更高的能量X射线数据。
- Both XTrace andRapid Stageare seamlessly integrated in theESPRIT软件.
- 通过将电子激发的更好光元灵敏度与XRF的更好的痕量元素灵敏度相结合，将EDS和Micro-XRF定量结合起来，从而实现了更完整的样品表征。
- Simultaneous mapping with micro-XRF and e-beam excitation, combining the advantages from both worlds. Exciting the light elements (carbon to sodium) using the e-beam and heavier elements by micro-XRF.
- Separate peaks & extended spectral range enables the capability to see the high energy K- lines since they are less complex and less overlapped.
- Minimum sample prep – no conductive sample surface and no extensive polishing required
- 无标准和基于标准的量化。
