InSight CAP
Non-destructive Metrology for Etch and CMP
Faits marquants
A High-Performance Profiler and AFM in a Compact Form Factor
Bruker的Insight Cap Automated Atomic Force Profiler是专门设计的，是用于半导体制造商和供应商的CMP和Etch Metrology的组合平台。灵活的配置可为晶圆尺寸从100毫米到300毫米，可为广泛的最终应用启用精确测量。从高生产力的实验室到完全自动化的Fabs，可以为最具成本效益的计量解决方案提供最佳配置的Insight Cap Profiler。
Caractéristiques
Inline Metrology Results in Minutes, Suitable for Technology Development and Process Control in Etch and CMP
在先进技术节点,多重图像lithography techniques place nanometer-level process control requirements on CMP to meet depth-of-focus needs. InSight CAP is built around the latest generation AFM scanner to deliver improved flatness, less than 10 nanometers, over a 65 μm X / Y scan range. The system’s NanoScope® V 64-bit AFM controller offers 5x faster engage performance and 5x faster tuning for increased productivity, all with enhanced reliability. Its DT adaptive scan mode also contributes to faster scanning and improved metrology. With its combination of advanced features, the InSight CAP High-Resolution Profiler enables angstrom-level precision to measure in-macro dishing and erosion.
灵活的配置可为晶圆尺寸从100毫米到300毫米，可为广泛的最终应用启用精确测量。从高生产力的实验室到完全自动化的Fabs，可以为最具成本效益的计量解决方案提供最佳配置的Insight Cap Profiler。
Support
Support
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解决real-w力量合作伙伴与我们的客户orld application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.