NM-VI
5nm生产光掩模维修
高亮
高级，关键级别的光鞋的精确修复
布鲁克’s AFM nanomachining systems are the global standard and preferred production technique for precision repair of advanced, critical-level photomasks. The nm-VI®系统是Bruker的第六代AFM引导的纳米机械。NM-VI将布鲁克（Bruker）与该公司脱颖而出，可以开发和交付与5纳米技术节点及以后的5纳米技术节点合作所需的创新纳米级材料成型过程。
功能
行业领先的面具维修方法
Nanomachining is a unique defect repair technique in the semiconductor industry, combining the positional control of an AFM and proprietary Nanomachining hardware and software to perform material removal at nanometer levels.
它的吸引力在于精确地清除各种材料的缺陷，包括铬，不透明的Mosi，Nitride硅，石英，EUV，外来材料和未知颗粒。bob综合游戏它的迭代维修能力和平面材料去除可确保修复区域，并具有更宽的“通过焦点”传输窗口。
Addressing Industry's Critical Challenges
Bruker的AFM引导的纳米机器具有六代和近20年的内联经验，具有独特的优化和增强功能，可控制高端光掩膜的模式缺陷，随着特征大小和掩模复杂性的降低。值得注意的功能包括：
- StandardBitClean®函数 - 特殊的硬件和软件自动化，可使用纳米机械尖端提供最终的固有局部清洁能力，以消除持续的未知粒子污染。
- 集成的本地模式复制功能是系统的标准配置。
- Design Image Retrieval Package (optional) includes computer hardware and nm-VI system interface software. It provides the capability to retrieve segments of mask repair area pattern images from original design files, correct for AFM scanned image, display and overlay on the designated repair area for operator executed repair.
A Technique with Minimal Trade-Offs
The nm-VI offers production proven nanomachining with few downsides. The AFM-based nanomachining technique boasts the following over other (focused ion beam (FIB) and laser or electron beam) mask repair systems.
- 没有真空要求
- 没有化学
- 没有化学残留物
- no beam related charging effects
- no need for constant drift correction by re-registration to undesirable positioning markers
支持
支持
我们能帮你什么吗？
Bruker与我们的客户合作解决了现实世界中的应用程序问题。我们开发下一代技术，并帮助客户选择正确的系统和配件。在工具出售工具很久之后，这种合作伙伴关系继续通过培训和扩展服务。bob电竞官方网站
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.