JV-DX
Designed for a variety of thin-film applications
ハイライト
JV-DX
The Bruker JV-DX is the latest generation of X-ray metrology system for semiconductor thin film analysis for materials’ research, process development and quality control. Featuring fully automated source optics, the system can switch between standard XRD, High-Resolution XRD (HRXRD) and X-ray reflectivity modes without user intervention. Measurements are fully automated within recipes with the ability to also perform more esoteric measurements in semi-manual mode.
特長
Full 300mm Wafer Mapping
该仪器专为各种薄膜应用而设计，包括高分辨率摇摆曲线，相互的空间映射，X射线反射率，放牧XRD，相位ID，残留应力，膜质地和晶粒尺寸分析以及XRF。
The sample stage consists of a robust 5-axis Eulerian cradle, with full 300 mm wafer mapping, and capacity for both large and small samples. Multiple sample locations for smaller samples are provided to enable multiple measurements across multiple samples to be queued and performed automatically, even of different measurement types.
サポート
Support
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布鲁克partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
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